George Laboratory
@GeorgeGroupCU
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Our research group at CU concentrates on surface chemistry, thin film growth & etching, and nanoscale engineering. We focus on ALD, ALE, and MLD.
Boulder, CO
Joined June 2016
A photo of our current group members and alumni at #ALDALE2022 (missing Taewook Nam and Zach Sobel)
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#ALEtch post-doc position at #GeorgeGroupCU Come to Colorado and work on a quadrupole mass spectrometry molecular beam system designed for exploring reaction pathways in thermal atomic layer etching (ALE). Full posting: https://t.co/GXmKxO0STo
@AvsAld @AVS_TFD @AtomicLimits
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#ALEtch post-doc position at #GeorgeGroupCU Come to Colorado and work on a quadrupole mass spectrometry molecular beam system designed for exploring reaction pathways in thermal atomic layer etching (ALE). Full posting: https://t.co/RRaPmxASQD
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My final paper from my time with @GeorgeGroupCU and @CUBoulder was just published in Applied Surface Science. Check out how we use ALD to smooth surface roughness for improving mirror reflectance! #ALDep #optics
https://t.co/rijFPvknrX
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Excited to be included on this manuscript in Desalination from Brian Welch and @GeorgeGroupCU! Spatial MLD was used to modify nanofiltration membrane surfaces as an alternative method for tuning desalination properties. https://t.co/SEVewlefp4
#MLDep #membranes #desalination
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Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry by @annLiiRosales was published online today. https://t.co/BK7BFZyDnG
pubs.acs.org
Thermal atomic layer etching (ALE) can be performed using sequential reactions based on surface modification followed by volatile release of the modified surface layer. Surface modification can be...
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Featured Article @JVSTAB on Hafnium and Zirconium oxyfluoride #AlDep from @MarcelJunige @GeorgeGroupCU
https://t.co/eIdhZq0Tbl
@AVS_Members @AvsAld
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch Steven George ALE2-MoA17 - Thermal Atomic Layer Etching of Ta2O5 and TaN using BCl3 and HF: Evidence for a Conversion-Etch Mechanism
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch Andrew Cavanagh ALE2-MoA13 - Volatile Products from Thermal Atomic Layer Etching Observed using Mass Spectrometer with Line-of-Sight Detection
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch David Zywotko ALE2-MoA15 - Blocking Thermal Atomic Layer Etching with Removable Etch Stop Layers
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch Zachary Sobell AS-WeM02 - Cobalt Electron-Enhanced ALD (EE-ALD) Using High Electron Flux HC-PES: Rapid Growth and Bottom-Up Fill
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch Jessica Murdzek ALE1-MoA03 - Thermal Atomic Layer Etching of Nickel Using SO2Cl2 and P(CH3)3
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On demand sessions at #ALDALE2020 go live at 12:00 EDT. Be sure to view the exciting contributions from @GeorgeGroupCU. #ALDep #ALEtch Neha Mahuli AF-TuA05 - Atomic Layer Deposition of Erbium Oxide‚ Erbium Fluoride and Stoichiometrically-Tunable Erbium Oxyfluoride Films
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Congratulations to the 2020 board members of #RMCAVS. Jamie Dumont #ForgeNano Tim Gessert Daniel Nelson #Leybold_Vacuum Michael Simmons #Intellivation1 Jing Zhou #UofWyoming
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