How atomic scale processing can help to pave the way for future quantum devices: A Workshop to bridge ALD/ALE and Quantum communities #ALDep https://t.co/JzKEp8KvZ9

Advancing Thin Film Metrology in 3D Structures: The Benefits of the PillarHall Concept @chipmetrics #ALDep https://t.co/IrHQTrsT5W

Passivating Contacts for Silicon Solar Cells: A Zinc Oxide Breakthrough? https://t.co/IMwG2h52h9 #ALDep #solar #SolarCells #ZincOxide #Photovoltaics

Surface passivation as a cornerstone of modern semiconductor technology – Highlighting a comprehensive review paper on surface passivation for silicon, germanium, and III–V materials #ALDep #AtomicLimits #semiconductors https://t.co/g95Jq2Y28H

AI serving the ALD community – Using ChatGPT 4 to extract ALD parameters from scientific papers #ALDep https://t.co/AYWMYSCmLd

Introducing the new AtomicLimits ReviewBase – New features, new design and more to come! #ALDep https://t.co/QguEtgWIui

The Significance of Plasma Physics in EUV Lithography – Teaching ASML employees my Introduction to Plasma Physics course https://t.co/CHEsPaawzN

Substrate biasing as a tuning knob for superconducting films – the “ALD and ALE for quantum project” celebrates its first year with a publication #ALDep https://t.co/N7yEuYGnDh

Atomic Limits company talk: Trymax and their innovative plasma based equipment solutions https://t.co/IEpBIGht0u

Atomic limits company talk: ATLANT 3D – Atomic layer processing technology #ALDep https://t.co/Yt6gcZjYu3

Read about Eindhoven-based spatial ALD company SparkNano in our second "Company talks" blog on AtomicLimits! #ALDep #atomiclayerdeposition https://t.co/NjWRiAiVIT

Looking back at the Spatial ALD day: with photos and downloadable presentations! #ALDep https://t.co/PC2qCrbpcq

Update of the Atomic Scale Processing ReviewBase – Easy-to-access overview of ALD and ALE reviews (extended), ASD reviews (new) and ALD book chapters (new) #ALDep https://t.co/8jMSitp3sL

Save the date! On June 9th 2022, we will organize a spatial ALD day at the Eindhoven University of Technology. You can preregister on the website! The final registration form will appear early May when the detailed program is known. https://t.co/GjjpkGRdDX #ALDep #ALD

Atomic Limits company talk: SALD and their spatial ALD business - an interview with Bas van de Loo and Peter Visser #ALDep https://t.co/QdXh4SFcFs

Atomic Layer Etch Carves the Path to More Efficient Computing #ALEtch. @Merck_Elec @EMD_Electronics https://t.co/2d02dK7356

Metal-on-metal area-selective deposition: Why cobalt succeeded where tungsten failed #ALDep https://t.co/BSQn4yvbbz

New blog: Erwin Kessels reflects on his 10 years of chairing the Plasma & Materials Processing group at TU/e! https://t.co/tnEcpgnRrZ

Students in plasma processing: A sneak peek into the real world – part II: the student perspective https://t.co/gSlSaJPlMM

Unravelling complex nanoelectronic devices A challenge-based learning assignment – part I: the teacher perspective https://t.co/8dKSy90w9F