I forgot who it was, but someone on here disagreed with me that it's possible to tell if an SEM image is photoresist or if it's after-etch into a hard mask, like SiN…anything that's not photosensitive. I can tell by the exposure dose of the SEM image. All photoresists are

Apparently we now (for the first time?!) have methods to study the behavior of photoresist in situ, and this can bigly improve yields By *we* I mean China; since it's openly published, it's not some deep IP… I guess. @lithos_graphein @zephyr_z9 @basedjensen is this a big deal?

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SemiAnalysis is on a tech meme tear. 😂

Continuous flow polymer synthesis is the holy grail for chemistry right now. For semiconductors it can be used to make polymers for photoresists and BARCs. Brewer lists the generic advantages in their abstract here: • enhanced reaction control • improved reproducibility •

Information exchange on a mass scale. I come from a long line of printers. Same thing different era.

ASML has the best technical marketing team. This video explains in layman's terms how source mask optimization (SMO) works. It's the engineering sorcery behind printing the most advanced chips.

The field-effect transistor (FET) was patented by Julius Edgar Lilienfeld in 1925, but the patent expired before anyone could figure out how to actually make it.

If you were wondering how something like this works... LAM (Coventor) published a self-aligned litho-etch litho-etch (SALELE) process flow for 18 nm pitch metal in a PR td. It's different from Intel's version published in the journals. This uses low-NA EUV at a relaxed pitch to

Korean semiconductor equipment startup breaks Carl Zeiss’s monopoly, supplies EUV inspection equipment to Japanese photomask company A South Korean semiconductor equipment startup has supplied hundreds of billions of won worth of ultra-precise extreme ultraviolet (EUV) mask

Yes, litho eye sees this. Not normal. How do you print this with a scanner?

Did they publish anything more than 2 SEM images? Lmk

Litho Eye Anomalies: 1) These are etched lines, not trenches. It may indicate it's a negative-tone photoresist system. 2) There is a clear top-to-bottom signature for the lines where the tops are wider and the bottom tails off in width. Or it's the inverse of this. Almost every

Don't spill it on your shoe. It leaves a mark.

Can't fool the litho eye. Do you see the trick here?

Good point @AurelianoPisa. Advertise better.

How's that sanctions-busting immersion scanner coming along?

But 🇺🇸 Tesla has awesome EVs, it's so simple and inevitable in coming years. "Building such a unique supply ecosystem requires decades of effort plus billions of dollars in annual capital expenditure. OSAT margins are slim, so starting anew elsewhere yields nearly zero return

EUV in the wild. Looks like we have a step stool there for manually loading the reticle pods.

ASML 스캐너의 역사 와 중국의 도전 (25.10.24) The History of ASML Scanners and China's Challenges (October 24, 2025) {blog post summary of @lithos_graphein's thread) https://t.co/iZQ9OMAl5C